50MW PV Cells Production Line

Second-hand 50MW Solar Cells Production Line suitable for production of multi and mono 156mm x 156mm PV cells.

The Line is still in position, not dismantled.

Purchase Price in 2008: 30 million USD

 

Delivery

EXW or FOB

Delivery FOB includes equipment, dismantling cost, packing cost, inland transportation cost, loading on boat.

n° Containers: 33x 40″ containers for Machines + 2x 40″ containers for Spare parts.

 

Production

Nominal Throughput: 1.400 cells/hour

Multi: 52MW (Net: 48MW, 92% operation rate)

Mono: 54MW (Net: 50MW, 92% operation rate)

 

Equipment List

  • Intex + loader & unloader
  • Doping transfer
  • 2x Doping furnace
  • PG etcher
  • 2x PECVD
  • 4x Screen printer
  • 3x Dryer
  • Firing furnace
  • Laser
  • Cell tester & Sorter

 

Intex loader

Manufacturer: MANZ

Manufacturing year: 2008

Model: ITL3000

Type: inline

Capacity: 3000 pcs/hr , 380V,  5A (7A)

Size: 3.366 x 3.225 x 2.957 mm – 3.790 Kg

 

Intex

Manufacturer: RENA

Manufacturing year: 2008

Inline texture etching machine + chiller

Capacity: 1500 pcs/hr, 380V, 98A

Size: 9.696 x 1.900 x 2.965 mm – 9.100 Kg

 

Intex unloader

Manufacturer: SFA

Manufacturing year: 2008

Type: batch

Capacity: 1700 pcs/hr, 220V / 12 KVA

Size: 3.600 mm x 1.950 mm x 2.060 mm

 

Doping transfer

Manufacturer: SFA

Manufacturing year: 2008

Type: batch

Capacity: 1700 wafer/hr, 380V

Size: 2.341 x 2.000 x 2.540 mm

Wafer loading/ unloading (boat<=>carrier)

 

Doping furnace

Manufacturer: KOYO (Japan)

Manufacturing year: 2008

Type: batch

Size: 8.400 x 2.100 x 2.900 mm

POCl3 doping diffusion (Multi/Mono)

Throughput: 1.920 wafers/hour (2 units, 5 & 6 inch), 380V, 100A (200A)

Batch type: 300 wafer/boat – 4 tube/unit

Fully automated process

Facility supply: POCl3, O2, N2, CDA

 

PSG Etcher

Manufacturer: RENA (Germany)

Installation date: 2008

Model: PG-ETCH 200

Task: Inline Etching (PSG removal – Multi/Mono)

Component: LD-SDR-Cleaning-Dry-UNLD

Throughput: 1700 wafers/hour (6inch)

Inline type

Fully automated process

Facility supply: HF, HCl, DIW

Size: 8.790 mm x 2.150 mm x 2.530 mm

 

PECVD

Manufacturer: SHIMADZU (Japan)

Manufacturing year: 2008

Model: SLPC-71H5DR

Type: inline

Task: anti reflection coating (Multi/Mono)

Throughput: 1800 wafers/h

5 chamber, 48wafer/cart (6 inch) – 70wafer/cart (5 inch)

Direct plasma (250 KHz)

Fully automated process

Facility supply: SiH4, NH3, CDA, N2, He

Size: 16.8 m x 3.0 m x 1.8 m

 

DRYER

3 units

Manufacturer: BACCINI (Italy)

Manufacturing year: 2008

Inline Dryer oven

Capacity: 1400/hr, 380V

 

Screen Printer

4 units

Manufacturer: BACCINI (Italy)

Installation date: 2008

Throughput: 1400 wafers/hour (5 & 6 inch)

Type: inline

Optical alignment

Fully automated process

Double printing system

Facility supply: Ag, Al paste, CDA, Power

Size: 18.5 m x 2.5 m x 2.0 m

 

Firing Furnace

Manufacturer: Despatch (USA)

Manufacturing year: 2008

Model: CDF-7210

Task: Dry & Firing (Multi/Mono)

Throughput: 1700 wafers/hour (5 & 6 inch)

Main component: Mesh belt conveyor system / dry zone & firing zone / condenser

Ultrasonic cleaning system

1 rows

Type: inline

Facility supply: N2, CDA, Power

Size: 7.366 mm x 1.270 mm x 1.650 mm

 

Laser

Manufacturer: BACCINI (Italy)

Manufacturing year: 2008

Model: POWER LINE D-100

Type: inline

Capacity: 1440 pcs/hr, 380V, 19A

Task: Laser edge isolation with LD-Laser

 

Cell tester & Sorter

Manufacturer: BACCINI (Italy)

Manufacturing year: 2008

Model: PSS10

Type: INLINE

Throughput: 1440 wafers/hours ( 5 & 6 inch)

Color vision system / front & rear side inspection / 48bin sorter

Size: 10m x 1.6m x 2m

Machine Type

Manufacturer

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Vintage

2008

Location

Asia

SKU: 50_MW_CellsLine Category:
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